Top Anti-Reflective

Applications

TARC (Top Anti-Reflective Coating) materials are designed for advanced lithography processes. TARC effectively suppresses reflected light from the photoresist/substrate interface, preventing standing wave effects and pattern distortion. It also improves critical dimension (CD) control and line edge roughness (LER) stability, ensuring better pattern fidelity and higher lithography yield. 

 

 

Features

 

• Suppresses reflected light
• Enhances pattern resolution and uniformity
• No intermixing of PR or dissolution with PR
• High dissolution rate
• Low metal ions

Specifications