Cu/Mo Etchant
Features
- Hydrogen peroxide type is environmental friendly
- Good stability for very high copper loading (> 10k ppm)
- Good etching uniformity
- Good taper profile after etching.
Specifications
| Test Items | Unit | DE-series | Remarks |
|---|---|---|---|
| Max.Cu Loading | ppm | > 10k |
|
| Etching Rate | Å/min | 4,000~6,000 | 35℃ |
| pH value |
| 3.7~4.4 |
|
| H2O2 Concentration | % | 6.0~8.5 |
|
| Taper | ° | 30~70 |
|