Applications

During Lithographic processes, developers are used to obtain patterned images that are projected onto primitive surfaces of photoresists. Following this development process, unexposed areas of negative type photoresist will be dissolved and removed, while only patterned areas that are exposed to UV light remain.

Water based developers are usually alkali solutions. When combined with surfactants, developers can improve levels of cleanliness, additional to improving properties of dispersion on cleansed substances. Once the developers have removed superfluous debris and untreated materials, further etching and other types of manufacturing can proceed. 

Features

1. Both Dip and Spray Methods are Applicable
2. High Resolution after Development and Significant Tolerance for Development Time Variation
3. High Development Ability with Low Variance in Development Properties
4. Excellent Dispersion Stability for Dissolved Photoresist

Specifications