Product
LCD Materials
LCD Materials
Black Matrix Resist
Applications |
Black Matrix is arranged in the form of stripes, grids or mosaics between color patterns of the Red, Green and Blue pixel arrays in the color filter.
Our product is designed for high light-shielding properties to increase the contrast ratio of LCD panels. Additionally, black matrix is deposited to a glass substrate to prevent leakage of backlight and color mixing from adjacent pixel formations, which also enhances contrast.
Features |
- High Optical Density
- High Coating Uniformity, High Sensitivity, Excellent Adhesion, Excellent Developing Performance
- Excellent Reliability in Thermal, Light, and Chemical Resistance
- Greater durability
New: Black Matrix Resist for LCD Panel with High Resolution
Specifications |
Product Name | ABK406X | ABK408X | Remarks | ||
Field of Application | Full High Definition | Ultra High Definition | |||
Features | Standard | High Resolution High Resistance |
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Viscosity | cP | 3.0 ± 0.5 | 3.0 ± 0.5 | ||
Non-Volatile Matter Content | % | 13~15 | 13~15 | ||
Line Width | μm | 8 ~ 30 | 4 ~ 8 | ||
Remaining Film Thickness | % | 75 ~ 85 | 75 ~ 85 | After PB/ Before PB (PB: 230°C x 20min) |
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Process Conditions | Soft-Bake | °C; sec | 70~120; 90 | 70~120; 90 | |
Exposure Energy | mJ / cm2 | 45 ~ 100 | 45 ~ 100 | ||
Development | KOH / Buffer | KOH / Buffer | At 23°C ~ 25°C | ||
Hard-Bake | °C; min | 230; 20 | 230; 20 | ||
Optical Density | / μm | 4.4 ~ 4.0 | 4.4 ~ 3.0 | ||
Surface Resistivity | Ω / □ | 1 x 108 | > 1 x 1014 | ||
Chemical Resistance | IPA | (ODBefore-ODAfter)/ μm | < 0.1 | < 0.1 | After 25°C Dip 5min +120°C x 2mins |
NMP γ-buthyrolactone PGME DPGME |
(ODBefore-ODAfter)/ μm | < 0.1 | < 0.1 | After 25°C Dip 5min + 240°C x 15mins | |
Weight Loss | % | < 3 | < 3 | After PB + 230°C x 60min by TGA | |
Pressure Cook Test | 5B | 5B | After PB + 230°C x 180min 121°C, 2atm, RH 100% for 24hr by cross-cut test |